| 摘要 |
<p>The present invention relates to a method of producing an anti-reflection and/or passivation coating for solar cells comprising the steps of providing a silicon wafer in a deposition chamber, pre-heating of said silicon wafer to a temperature above 400 ° C and deposition of a hydrogen containing anti-reflection and/or passivation coating by a sputter process as well as to a coating apparatus for producing solar cells , especially anti-reflection and/or passivation coatings on Si wafers, especially for carrying out the inventive method, comprising a first vacuum chamber (1), a second vacuum chamber (2) and conveying means (4) for transporting a substrate (5) through said first and second vacuum chambers in this order, said first vacuum chamber comprising at least one infrared radiation heater (16) being capable to be heated such that a heater filament has a temperature between 1800°C and 3000°C and said second vacuum chamber comprising sputter means (12) for vaporization of a target as well as a gas inlet for introducing a reactive gas including hydrogen.</p> |
