Wet cleaning method of semiconductor wafer having exposed nitride film,申请号KR20060027162-传众专利搜索

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发明名称	Wet cleaning method of semiconductor wafer having exposed nitride film
摘要
申请公布号	KR100861360(B1)	申请公布日期	2008.10.01
申请号	KR20060027162	申请日期	2006.03.24
申请人		发明人
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
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