| 摘要 |
An apparatus for cleaning a wafer is provided to maximize the cleaning effect of the wafer by rotating the wafer in a processing chamber to uniformly distribute a cleaning solution on a surface of the wafer. A process chamber(200) performs a wafer cleaning by using a cleaning solution. A support(210) is provided with a rotational fan(211) and rotatably arranged in the process chamber. The support mounts the chamber. A fixing rod(220) is installed in the process chamber so as to mount the support. A supply pipe(230) supplies the cleaning solution into the process chamber. Grooves are formed on the support at regular intervals for mounting a plurality of wafers. The rotating fan has a protrusion structure to rotate the support through the flowing of the cleaning solution supplied from the supply pipe. The fixing rod is installed to allow the support to rotate.
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