发明名称 Methods of fabricating interferometric modulators by selectively removing a material
摘要 Methods for making MEMS devices such as interferometric modulators involve selectively removing a sacrificial portion of a material to form an internal cavity, leaving behind a remaining portion of the material to form a post structure. The material may be blanket deposited and selectively altered to define sacrificial portions that are selectively removable relative to the remaining portions. Alternatively, a material layer can be laterally recessed away from openings in a covering layer. These methods may be used to make unreleased and released interferometric modulators.
申请公布号 US7429334(B2) 申请公布日期 2008.09.30
申请号 US20050090778 申请日期 2005.03.25
申请人 IDC, LLC 发明人 TUNG MING-HAU;KOTHARI MANISH;CUMMINGS WILLIAM J.
分类号 B29D11/00 主分类号 B29D11/00
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