发明名称 Electrostatic chuck for wafer metrology and inspection equipment
摘要 An electrostatic chuck is configured for electrostatically securing a wafer while limiting charge on the wafer and physical contact between the electrostatic chuck and the wafer. The electrostatic chuck has a pair of electrodes and at least one support pin electrically isolated from the electrodes. The top portion of the support pin protrudes above the top surface of the electrodes. The support pin can be such that the top portion of the support pin is adjustable with respect to the top surfaces of the electrodes.
申请公布号 US7430104(B2) 申请公布日期 2008.09.30
申请号 US20030449539 申请日期 2003.05.29
申请人 APPILED MATERIALS, INC. 发明人 LITMAN ALON;KRIVTS IGOR
分类号 H01L21/683;H05F3/00 主分类号 H01L21/683
代理机构 代理人
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