| 摘要 |
[PROBLEMS] To provide a sintered sputtering target containing two or more high-melting metals which is suppressed in the elimination of particles of metals other than the matrix-forming major component and the production of impurities such as gaseous matter by improving the target structure and which is suppressed in the arcing in sputtering and the production of particles and improved in the quality of deposit and the workability of targets by enhancing the density of the target. [MEANS FOR SOLVING PROBLEMS] A sintered sputtering target made of high-melting metals which is a sintered high-melting metal body that contains less than 50 at.% of at least one minor component selected from among W, Ta and Hf with the balance being at least one major component selected from among Ru, Rh and Ir and unavoidable impurities, characterized in that a minor component metal phase or an alloy or compound phase consisting of the major and minor components is present in the form of particles having a mean particle diameter of 100 to 500mum in the major component metal structure.
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