发明名称 Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same
摘要 Compositions that can be used in semiconductor manufacturing processes, comprising perhydro-polysilazane having a weight average molecular weight of about 300 to about 3,000 and a polydispersity index of about 1.8 to about 3.0 are provided. Solutions comprising the compositions of the present invention, methods of forming films in a semiconductor manufacturing process, and methods of manufacturing semiconductor devices are also provided.
申请公布号 US7429637(B2) 申请公布日期 2008.09.30
申请号 US20050298785 申请日期 2005.12.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HONG EUNKEE;NA KYUTAE;GOO JUSEON;KIM HONG GUN
分类号 C08G77/12;H01L21/20;H01L21/312;H01L21/316;H01L21/768 主分类号 C08G77/12
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