| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>Lithographic Apparatus and Device Manufacturing Method A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks 11, 12 and an armature 13 comprising three open coil sets. The linear motor may be used to drive a stage, particularly the mask stage, in a lithographic projection apparatus.</p> |
| 申请公布号 |
SG145538(A1) |
申请公布日期 |
2008.09.29 |
| 申请号 |
SG20040011557 |
申请日期 |
2004.03.09 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HOL, SVEN ANTOIN JOHAN;COMPTER, JOHAN CORNELIS;LOOPSTRA, ERIK ROELOF;VREUGDEWATER, PATRICIA |
| 分类号 |
H01L21/027;G03F7/20;H02K41/02;H02K41/03;(IPC1-7):H01L21/02;H02K3/24 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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