Narrow band x-ray system and fabrication method thereof

摘要

An apparatus for producing substantially narrow band x-ray beams comprises a source of a first x-ray beam; and a narrow band x-ray filter having a first end, a second end and a focal point located nearer to the first end than to the second end. The source is disposed substantially at the focal point and the filter is configured so as to receive at the focal point at least a majority of the cross-section of the first x-ray beam and to output a plurality of second x-ray beams. Each of the second x-ray beams are a substantially narrow band x-ray beam. The narrow band x-ray filter further comprises a substrate and a sheaf of one or more reflection units stacked upon each other on the substrate. Each reflection unit can include a first set of at least two discrete spacers on a respective underlying structure or can include base means; in cross-section having portions resembling a staircase including two or more steps, respectively, for supporting a reflector on a respective underlying structure. If each reflection unit includes a first set of at least two discrete spacers then a reflector is disposed on the first set of spacers so as to form a void between the respective underlying structure and the reflector. Each reflection unit can further include a first set of at least two discrete shims disposed on the first set of at least two spacers. Each shim is at least substantially the same thickness as the reflector. If each reflection unit includes a base means then the reflector is disposed on the base means so as to form a void between the respective underlying structure and the reflector.