发明名称 APPARATUS AND METHOD FOR MANUFACTURING HIGH PURITY POLYCRYSTALLINE SILICON
摘要 An apparatus for manufacturing high purity polycrystalline silicon and a method thereof are provided to allow a continuously stable supply of zinc gas as a reducing agent, thereby continuously manufacturing high purity polycrystalline silicon with low cost in large quantities by a compact structure. An apparatus for manufacturing high purity polycrystalline silicon includes a silicon chloride vaporizer, a zinc melting evaporator, a vertical reactor, a silicon chloride gas supply nozzle(2), a zinc gas supply nozzle(3), and an exhaust gas discharge pipe. The vertical reactor has a heater provided on a peripheral surface thereof. The zinc gas supply nozzle is disposed to connect the silicon chloride vaporizer to the vertical reactor, and provides silicon chloride gas from the silicon chloride vaporizer in the vertical reactor. The zinc gas supply nozzle is disposed to connect the zinc melting evaporator to the vertical reactor, and provides zinc gas from the zinc melting evaporator in the vertical reactor. The exhaust gas discharge pipe is connected to the vertical reactor.
申请公布号 KR20080085716(A) 申请公布日期 2008.09.24
申请号 KR20080024290 申请日期 2008.03.17
申请人 CHISSO CORPORATION 发明人 NAMIKI NOBUAKI
分类号 H01L21/22;H01L21/205 主分类号 H01L21/22
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