Evaporator for CVD and gas flow rate regulator.

摘要

A metal-organic vaporizing and feeding apparatus includes: a retention vessel (1) for retaining a metal-organic material (13); a bubbling gas feeding path (3) connected to the retention vessel (1), for feeding bubbling gas to the metal-organic material (13); a metal-organic gas feeding path (5) connected to the retention vessel (1), for feeding metal-organic gas generated in the retention vessel (1) and dilution gas to a deposition chamber; a dilution gas feeding path (7) connected to the metal-organic gas feeding path (5), for feeding the dilution gas to the metal-organic gas feeding path (5); a flow rate regulator (9) provided in the bubbling gas feeding path (3), for regulating flow rate of the bubbling gas; a pressure regulator (11) for regulating pressure of the dilution gas; and a sonic nozzle (S) disposed in the metal-organic gas feeding path (5) on a downstream side of a connecting position between the metal-organic gas feeding path (5) and the dilution gas feeding path (7).