Resist composition, method therefor, and pattern-forming method using the resist composition

摘要

A resist composition comprises (A) at least two kinds of resins each of which decomposes by the action of an acid to undergo an increase in its solubility for an alkali developer, wherein at least one kind of the resins (A) is a resin synthesized by living radical polymerization using a chain transfer agent represented by formula (I):
wherein:
A represents an organic group not containing hetero atoms; and
Y represents an organic group capable of releasing a radical.