| 摘要 |
A method of cleaning a chamber in an amorphous carbon-film depositing process using a gas separation type showerhead is provided to increase the cleaning efficiency by applying power for the plasmarization of cleaning gas to a gas injection module using the gas separation type showerhead, thereby increasing energy of the cleaning gas when cleaning an inner part of a reaction chamber after depositing an amorphous carbon film. In a method of cleaning an inner part of a reaction chamber after depositing an amorphous carbon film in an amorphous carbon-film depositing process using a gas separation type showerhead including a gas supply module having an outer supply pipe and an inner supply pipe, a gas separation module having a first dispersion area and a second dispersion area, and a gas injection module having a plurality of holes, the method of cleaning the chamber in the amorphous carbon-film depositing process using the gas separation type showerhead comprises the steps of: (a) applying power for plasmarization to the gas injection module; (b) supplying a first cleaning gas to one of the outer supply pipe and the inner supply pipe of the gas supply module, and supplying a second cleaning gas to the other of the outer supply pipe and the inner supply pipe of the gas supply module; (c) separately dispersing the first cleaning gas and the second cleaning gas in the gas separation module, thereby plasmarizing the first and second cleaning gases in the gas injection module to inject the plasmarized first and second cleaning gases into the reaction chamber in common through the holes; and (d) cleaning the inner part of the reaction chamber.
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