| 摘要 |
<p>This invention provides a photosensitive resin composition, which can realize excellent resist conformation on a substrate, and can simultaneously realize excellent developability and the refinement of peeled pieces upon etching, a photosensitive transfer film comprising a photosensitive layer formed using the photosensitive resin composition, and a method for pattern formation which can form a high-definition pattern using the photosensitive transfer film. The photosensitive resin composition is characterized by comprising a binder, a polymerizable compound, and a photopolymerization initiator and having a melt viscosity of 40,000 to 120,000 Pa.s at 50°C and 5,000 to 20,000 Pa.s at 70°C.</p> |
