发明名称 Methods of fabricating passive element without planarizing
摘要 Methods of fabricating a passive element and a semiconductor device including the passive element are disclosed including the use of a dummy passive element. A dummy passive element is a passive element or wire which is added to the chip layout to aid in planarization but is not used in the active circuit. One embodiment of the method includes forming the passive element and a dummy passive element adjacent to the passive element; forming a dielectric layer over the passive element and the dummy passive element, wherein the dielectric layer is substantially planar between the passive element and the dummy passive element; and forming in the dielectric layer an interconnect to the passive element through the dielectric layer and a dummy interconnect portion overlapping at least a portion of the dummy passive element. The methods eliminate the need for planarizing.
申请公布号 US7427550(B2) 申请公布日期 2008.09.23
申请号 US20060427457 申请日期 2006.06.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHINTHAKINDI ANIL K.;DALTON TIMOTHY J.;ESHUN EBENEZER E.;GAMBINO JEFFREY P.;STAMPER ANTHONY K.;VAED KUNAL
分类号 H01L21/20 主分类号 H01L21/20
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