发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PRINTED WIRING BOARD, AND METHOD FOR PRODUCING SUBSTRATE FOR PLASMA DISPLAY PANEL
摘要 Disclosed is a photosensitive resin composition containing a binder polymer (A) having a weight average molecular weight of 35,000-65,000, a photopolymerizable compound (B) having an ethylenically unsaturated bond, and a photopolymerization initiator (C). The component (B) contains a photopolymerizable compound (B1) having one ethylenically unsaturated bond, a photopolymerizable compound (B2) having two ethylenically unsaturated bonds, and a photopolymerizable compound (B3) having three or more ethylenically unsaturated bonds, and the ratio of the component (B3) to the total of the component (B) is 15-30% by mass.
申请公布号 KR20080085219(A) 申请公布日期 2008.09.23
申请号 KR20087019736 申请日期 2007.02.20
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 KUMAKI TAKASHI;MIYASAKA MASAHIRO
分类号 G03F7/028;G03F7/027 主分类号 G03F7/028
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