| 发明名称 |
Method of activating a silicon surface for subsequent patterning of molecules onto said surface |
| 摘要 |
The present invention relates to a method of activating a silicon surface for subsequent patterning of molecules onto said surface, and to patterns produced by this method, and further to uses of said pattern.
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| 申请公布号 |
US7427477(B2) |
申请公布日期 |
2008.09.23 |
| 申请号 |
US20040003805 |
申请日期 |
2004.12.03 |
| 申请人 |
SONY DEUTSCHLAND GMBH |
发明人 |
WESSELS JURINA;FORD WILLIAM E.;YASUDA AKIO |
| 分类号 |
C12Q1/68;H01L21/28;B05D3/04;B05D3/10;B05D5/00;C07H21/00;C12Q1/70;G03F7/00;G03F7/26;H01L21/02;H01L21/306;H01L21/3205 |
主分类号 |
C12Q1/68 |
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