发明名称 Horizontal electric field LCD TFT substrate having gate insulating layer of varying thickness and fabricating method thereof
摘要 A thin film transistor substrate structure of the present invention comprises a gate and a common lines formed from a first conductive layer; a data line formed from a second conductive layer and intersecting the gate and common lines, the data line insulated from the gate and common lines by a gate insulating film, a pixel area being defined by the intersection of the data and gate lines; a thin film transistor at the intersection; an extended portion of a common electrode in the pixel area; a pixel electrode formed from a third conductive layer connected to the thin film transistor and having an extended portion in the pixel area, a horizontal electric field formed by the pixel and common electrodes; and a plurality of pixel holes are defined, wherein the pixel electrode is disposed within at least one pixel hole and connected to a drain electrode.
申请公布号 US7428032(B2) 申请公布日期 2008.09.23
申请号 US20040978523 申请日期 2004.11.02
申请人 LG DISPLAY CO., LTD. 发明人 YOO SOON-SUNG;CHO HEUNG-LYUL
分类号 G02F1/1333;G02F1/133;G02F1/1343;G02F1/136;G02F1/1362;G03F7/20;H01L21/00;H01L29/786 主分类号 G02F1/1333
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