发明名称 Electron beam column for writing shaped electron beams
摘要 An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle beta of from about ¼ to about 3 mrads, where the acceptance semi-angle beta is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
申请公布号 US7427765(B2) 申请公布日期 2008.09.23
申请号 US20050243363 申请日期 2005.10.03
申请人 JEOL, LTD. 发明人 BULLER BENYAMIN;DEVORE WILLIAM J.;FROSIEN JUERGEN;JIANG XINRONG;LOZES RICHARD L.;PEARCE-PERCY HENRY THOMAS;WINKLER DIETER;COYLE STEVEN T.;BANZHOF HELMUT
分类号 A61N5/00;G21G5/00 主分类号 A61N5/00
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