| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology which facilitates the measurement of a dimension of a transparent conductive film pattern with a small thickness formed on a substrate for an LCD by increasing a contrast between a part of the transparent conductive film pattern and a part except the above part while the contrast at the edge of the transparent conductive film pattern is reduced as the thickness of the transparent conductive film pattern is reduced so that the measurement becomes harder by a conventional technology. SOLUTION: An illumination unit is equipped with a lamp for emitting a light with high intensity in a range not greater than an optical wavelength and an optical filter for blocking a component of a light with a wavelength longer than the optical wavelength, so that the contrast between the part of the transparent conductive film and the part except the above part is increased. As a result, the measurement of the dimension of the transparent conductive film pattern with the small thickness can be facilitated. COPYRIGHT: (C)2008,JPO&INPIT
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