| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for further reducing the possibility that a reticle is contaminated during conveyance and a method for further reducing the possibility that a reticle is contaminated while the reticle is moved between an atmospheric pressure and a vacuum. <P>SOLUTION: In the method for transferring the reticle from the atmospheric pressure to the vacuum in a lithography system, the system includes one or more, or two or more removable reticle cassettes 111. Each cassette has at least one air vent and at least one filter. The system further has an end part effector 113 coupled to a robot arm 115. Thus, the reticle 109 is disposed inside one among the cassettes 111, thereby forming a cassette reticle arrangement. <P>COPYRIGHT: (C)2008,JPO&INPIT |
