发明名称 TEMPERATURE MEASURING DEVICE, SCANNING EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a temperature measuring device capable of accurately measuring the temperature difference between a region where a pattern to be transferred is formed and a region where the pattern is not formed. <P>SOLUTION: The temperature measuring device 13 measures the temperature of an original plate M having pattern formation regions M1 to M5 where patterns to be transferred are formed; and the device includes first temperature measuring devices T1 to T5 to measure the temperature of at least one point in the pattern formation regions M1 to M5 and second temperature measuring devices t1 to t6 to measure the temperature of at least one point in non-pattern formation regions m1 to m6 where the pattern to be transferred is not formed. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008216554(A) 申请公布日期 2008.09.18
申请号 JP20070052754 申请日期 2007.03.02
申请人 NIKON CORP 发明人 KOYAMA MOTOO
分类号 G03F7/20 主分类号 G03F7/20
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