发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a projection optical system that prevents a rise in cost and has superior imaging performance by reducing an influence of birefringence due to a crystal structure. <P>SOLUTION: The present invention provides a projection optical system which projects an image on a first object plane onto a second object plane, comprising a plurality of optical members inserted in turn from a side of the second object plane, the plurality of optical members being made of an isotropic crystal and including a first optical member and second optical member in each of which <1 1 1> crystal axes are oriented in a direction of an optical axis and a third optical member in which <1 0 0> crystal axes are oriented in the direction of the optical axis, wherein maximum angles &theta;1, &theta;2, and &theta;3 between the optical axis and light beams passing through the first optical member, the second optical member, and the third optical member, respectively, satisfy ¾&theta;i-&theta;j¾<5&deg; (i, j =1, 2, 3). <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008216498(A) 申请公布日期 2008.09.18
申请号 JP20070051936 申请日期 2007.03.01
申请人 CANON INC 发明人 YAMADA AKIHIRO
分类号 G02B13/24;G02B13/18;G03F7/20;H01L21/027 主分类号 G02B13/24
代理机构 代理人
主权项
地址