发明名称 |
Substrate support member and apparatus and method for treating substrate with the same |
摘要 |
A substrate support unit supplies a swirl flow to a substrate to rotate and float the substrate from a chuck plate during a process. A process is performed while rotating and floating the substrate. Thus, the substrate is supported and rotates at a process speed while floating form the chuck plate with a non-contact manner.
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申请公布号 |
US2008223412(A1) |
申请公布日期 |
2008.09.18 |
申请号 |
US20070004504 |
申请日期 |
2007.12.20 |
申请人 |
LEE TAEK-YOUB;KIM BONG-JOO |
发明人 |
LEE TAEK-YOUB;KIM BONG-JOO |
分类号 |
B08B3/10 |
主分类号 |
B08B3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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