| 摘要 |
<p>[PROBLEMS] To provide a semiconductor manufacturing device that can be efficiently cleaned, a method of cleaning the apparatus, and a wafer for cleaning. [MEANS FOR SOLVING THE PROBLEMS] This semiconductor manufacturing apparatus (1) comprises a transfer chamber (2), a treatment chamber (5) connected to the transfer chamber (2), an auxiliary chamber (4) that is connected to the transfer chamber (2) and performs charging or discharging of the wafer (CW) for cleaning, and a conveying robot (6) for conveying the wafer (CW) to the transfer chamber (2), the treatment chamber (5) and the auxiliary chamber (4).</p> |
