ETCHING SOLUTION AND ETCHING METHOD

摘要

Disclosed is an etching solution which has excellent wettability on a hydrophobic bare silicon and enables the efficient etching of gold or palladium at a narrow gap. Specifically disclosed is an aqueous etching solution for use in the treatment of gold or palladium, which contains iodine, a salt of an iodide, water and a glycol ether compound. The glycol ether compound is preferably represented by the general formula (1). R<SUP>1</SUP>-O-(R<SUP>2</SUP>-O-)<SUB>n</SUB>-H (1) wherein R<SUP>1</SUP> represents an alkyl group having 4 to 20 carbon atoms; R<SUP>2</SUP> represents an alkylene group having 2 to 4 carbon atoms; and n represents an integer of 2 to 40.