| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a barrier film which has high oxidation resistance under a high temperature and high humidity environment, less pinholes, and high optical transmittance. <P>SOLUTION: The barrier film having high oxidation resistance under a high temperature and high humidity environment, few pinholes, and high optical transmittance is provided by including at least one layer of a silicon nitride film in which two or more silicon nitride films having different compositional ratios of Si/N are stacked. <P>COPYRIGHT: (C)2008,JPO&INPIT |
