| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint apparatus which can quickly form a high resolution pattern without a defect. SOLUTION: The imprint apparatus for forming a pattern on a substrate by using a mold includes a means for making the substrate and the mold approach each other or be brought into contact, a means for determining the dew point of at least one out of the vicinity of the mold, the vicinity of the substrate, or the atmosphere between the substrate and the mold, a means for adjusting the temperature of the substrate or the mold to a first temperature calculated on the basis of the dew point, and a means for applying voltage between the substrate and the mold. COPYRIGHT: (C)2008,JPO&INPIT
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