RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR MANUFACTURING ELECTRONIC DEVICE

摘要

A resist composition that in the technology of liquid immersion exposure, inhibits leaching into a liquid immersion medium and avoids performance deterioration, thereby attaining forming of a fine resist pattern; and, using the resist composition, a method of forming a resist pattern and process for manufacturing an electronic device. There is provided a resist composition for use in liquid immersion exposure, comprising at least a silicon compound having at least an optionally substituted alkali-soluble group and a resin having an alkali-soluble group optionally substituted with an acid elimination group.