发明名称 ACCOMMODATION TANK FOR SUBSTRATE STORING VESSEL
摘要 PROBLEM TO BE SOLVED: To provide an accommodation tank for a substrate storing vessel which meets a request for automation and achieves volume production while allowing to achieve high-precision positioning control and weight saving. SOLUTION: A substrate storing vessel has a metallic bottom plate 1, and the accommodation tank 10 which is mounted to the bottom plate 1 to accommodate an open cassette 20 immersed in stocked deionized water, wherein the accommodation tank 10 is injection-molded with molding materials containing resin, and has a bottom where an arrangement area 11 for the open cassette 20 is formed in a concave form. Semiconductor wafers are not manually immersed in the accommodation bath 10, but the open cassette 20 for accommodating many aligned semiconductor wafers is immersed in the accommodation tank 10 by means of a robot or an automatic machine, thereby allowing to meet a request for automation and to achieve volume production. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008218885(A) 申请公布日期 2008.09.18
申请号 JP20070057155 申请日期 2007.03.07
申请人 SHIN ETSU POLYMER CO LTD 发明人 ODAJIMA SATOSHI
分类号 H01L21/68;H01L21/304;H01L21/673 主分类号 H01L21/68
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