发明名称 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS
摘要 <p>A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1) : wherein R&lt;SUB&gt;1&lt;/SUB&gt; to R&lt;SUB&gt;8&lt;/SUB&gt; are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are optionally substituted with fluorine atom; R&lt;SUB&gt;9&lt;/SUB&gt; is hydrogen atom or hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group; and Y is oxygen atom or a single bond.</p>
申请公布号 WO2008111378(A1) 申请公布日期 2008.09.18
申请号 WO2008JP53002 申请日期 2008.02.14
申请人 CANON KABUSHIKI KAISHA;ITO, TOSHIKI 发明人 ITO, TOSHIKI
分类号 G03F7/039;C07D311/84;C08G8/32 主分类号 G03F7/039
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