| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily and inexpensively expose a pattern by exposure onto the top and back faces of a support without misalignment. <P>SOLUTION: A first photosensitive layer 19 and a second photosensitive layer 20 provided on the top and back faces of a transparent film 3, respectively, are irradiated with light through a photomask 29 disposed opposing to the first photosensitive layer 19. The light beams L1, L2 in the first and second wavelength bands corresponding to spectral sensitivities of the first photosensitive layer 19 and the second photosensitive layer 20, respectively, transmit through a first filter layer 35 and a second filter layer 36 provided on the photomask 29, and simultaneously expose a first pattern 39 and a second pattern 40 provided in the respective filter layers onto the photosensitive layer 19 and the second photosensitive layer 20. <P>COPYRIGHT: (C)2008,JPO&INPIT |
