| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus excellent in the transfer precision and the throughput. <P>SOLUTION: This exposure apparatus for exposing a substrate via a projection optical system and an immersion region comprises a first stage WS1 and a second stage WS2 equipped with a driving mechanism which are independently movable and move together in a proximity state in a two-dimensional plane nearly parallel to the image surface of the projection optical system on the image surface side thereof, and an immersion mechanism for forming the immersion region of a liquid on the top face of at least one stage of the first stage and the second stage. Liquid leak suppressing mechanisms 91 and 93 used when the immersion region is moved between the top face of the first stage and the top face of the second stage are provided on the side faces of the stages in the state where the liquid is held between the projection optical system and the top face of at least one stage by moving the first stage and the second stage together. <P>COPYRIGHT: (C)2008,JPO&INPIT |
