| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide immersion liquid to a space between a projection system and a substrate without involving in serious transmission of disturbance force to the substrate. <P>SOLUTION: A lithographic apparatus includes a liquid supply system constituted to provide the immersion liquid 5 to the space between the substrate W and the projection system, wherein the liquid supply system includes a barrier member 10 which is developed along at least a part of a boundary of the space, and is put on a right position to an object on a substrate table. With such an arrangement, in the liquid supply system, entire capillary pressures generated by the immersion liquid between the barrier member 10 and the substrate W will not become so high that the immersion liquid is restrained in the space. The barrier member 10 is not sealed so that the immersion liquid 5 may be allowed to flow out the space and between the barrier member 10 and the substrate W. <P>COPYRIGHT: (C)2008,JPO&INPIT |
