| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a lithographic method, which remove or reduce one or more problems of conventional technology. <P>SOLUTION: The lithographic apparatus includes a shutter system constructed and arranged to mask out parts of a patterning device or a substrate from a beam of radiation. The shutter system includes at least one moveable shutter. The apparatus also includes a control unit arranged to receive information regarding the extent to which a patterned beam of radiation would extend across a periphery of the substrate when being projected onto the target region of the substrate. The control unit is configured to move the shutter by a predetermined amount to affect the parts of the patterning device or the substrate masked out from the beam of radiation if projecting the patterned beam of radiation onto the target portion would involve the patterned beam of radiation extending across the periphery of the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
