| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new technique for reducing the entrapped oxygen in the liquids filled into the clearances between the final plane of a projecting optical system and a substrate of an exposure apparatus. <P>SOLUTION: The exposure apparatus has a projecting optical system for projecting the light emitted from a reticle and exposes a substrate to the light via the liquids filled into the clearances between the final plane of the projecting optical system and the substrate, and has a first feeding means for feeding a first liquid to a first region, including the optical axis of the final optical element of the projecting optical system, and a second feeding means for feeding a second different liquid from the first liquid to a second region present in the periphery of the first region. <P>COPYRIGHT: (C)2008,JPO&INPIT |
