| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device capable of inexpensively manufacturing a template of nano imprint lithography. SOLUTION: The method includes: a step of forming a polycrystalline membrane 54 on a base membrane 52 and a plurality of recesses 52a; and a step of forming a polycrystalline membrane 56 by crystallizing the polycrystalline membrane 54 with the polycrystalline membrane 54 positioned in a plurality of recesses 52a as a starting point, and forming a projecting 56a in the polycrystalline membrane 56 positioned among the plurality of recesses 52 by melting the polycrystalline membrane 54 positioned on the base membrane 52 and then crystallizing it after coagulation. COPYRIGHT: (C)2008,JPO&INPIT
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