EQUIPMENT FOR COATING PHOTO-RESISTER SPINNER AND CONTROL METHODE AT THE SAME

摘要

A photo spinner apparatus and a controlling method thereof are provided to reduce an error rate and to enhance productivity by inspecting photoresist patterns before loading a wafer cassette into a wafer cassette loader. A wafer cassette loader(230) loads a wafer cassette for storing a plurality of wafers. An index arm is formed to extract the wafers from the wafer cassette. A wafer transfer(250) transfers the wafers extracted by the index arm. A spin coater(210) rotates the wafers at a high speed in order to coat photoresist on the wafers. A bake unit(260) heats the wafers in order to harden the photoresist. A developing unit forms residual photoresist patterns on the wafers by developing the photoresist exposed by an exposure unit. An inspection unit(300) inspects the presence of the photoresist patterns and set positions of the photoresist patterns before the wafers are loaded into the wafer cassette.