发明名称 IMAGE SENSOR AND FABRICATION METHOD THEREOF
摘要 An image sensor contains a semiconductor substrate, a plurality of pixels defined on the semiconductor substrate, a photo conductive layer and a transparent conductive layer formed on the pixel electrodes of the pixels in order, and a shield device positioned between any two adjacent pixel electrodes. The shield device has a shield electrode and an isolation structure surrounding the shield electrode so that the shield electrode is isolated from the pixel electrodes and the photo conductive layer by the isolation structure.
申请公布号 US2008224136(A1) 申请公布日期 2008.09.18
申请号 US20070686957 申请日期 2007.03.15
申请人 WANG HSIN-HENG;HUANG CHIU-TSUNG;LIN SHIH-SIANG 发明人 WANG HSIN-HENG;HUANG CHIU-TSUNG;LIN SHIH-SIANG
分类号 H01L31/0232;H01L31/18 主分类号 H01L31/0232
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