| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which exhibits proper exposure performance by maintaining a uniform immersion state, even when exposing a region at the periphery of a wafer, so as to solve the problem of conventional local-fill immersion type exposure apparatuses, in which a liquid is fed to and collected from the gap between a projection lens and a wafer, and which cannot carry out proper exposure at the periphery of the wafer, because the volume of liquid that is required in filling the gap between the projection lens and the wafer changes, when the exposure region is at the periphery of the wafer, as compared to the situation when the exposure region is at the center region of the wafer. <P>SOLUTION: A local-fill immersion type exposure apparatus is equipped with an additional immersion liquid feed mechanism for feeding an immersion liquid from peripheral portions of a wafer, as well, as a conventional immersion liquid feed mechanism. Additional immersion liquid feeding mechanism has multiple feed ports at the periphery of a wafer and is a function of automatically controlling the timing, location, and amount to be fed. The mechanism also has a function of selectively turning ON/OFF a liquid collection function, provided to a wafer chuck or a mechanism adjacent to the wafer chuck. on the basis of the decision on the location of the exposure region at the periphery of a wafer and the timing. <P>COPYRIGHT: (C)2008,JPO&INPIT |
