| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for reproducing a quartz jig for plasma processing equipment that makes it possible to reproduce chamber component parts and is configured in such a way that it does not affect processabilities even if reproduction process is carried out permanently. SOLUTION: A quartz jig covers the peripheral part of a bottom electrode where a semiconductor substrate of plasma processing equipment is mounted and the semiconductor substrate is not sandwiched between the bottom substrate and the quartz jig. The quartz jig comprises: a main surface extending from the inner peripheral edge to the outside; a first area formed on the inner peripheral side and has a flat first surface on the main surface; and a second area adjacent to the outside of the first area, made of the same material as that of the first area, formed thinner than the first area, and has a second surface on the main surface, which is lower than the first surface. The quartz jig is thus provided to solve the above problem. COPYRIGHT: (C)2008,JPO&INPIT
|
