发明名称 |
SEMICONDUCTOR SUBSTRATE TEMPERATURE MEASURING DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING DEVICE INCLUDING IT, TEMPERATURE MEASURING METHOD FOR SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To measure a temperature of a semiconductor substrate with high accuracy and high reproducibility. SOLUTION: An MBE device 20 acting as a semiconductor device manufacturing device including a semiconductor substrate temperature measuring device is provided with a substrate temperature calculating device 11 which calculates a temperature of a substrate 2 based on a spectrum of scattered light scattered by the substrate 2 in the semiconductor substrate temperature measuring device which measures a temperature of a semiconductor substrate. The substrate temperature calculating device 11 compensates the temperature of the substrate 2 calculated based on the spectrum of the scattered light, based on a dopant concentration of the substrate 2. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008218929(A) |
申请公布日期 |
2008.09.18 |
申请号 |
JP20070057868 |
申请日期 |
2007.03.07 |
申请人 |
SHARP CORP |
发明人 |
SHIMIZU KAZUHISA;UNEYAMA KAZUHIRO;SAKAGAMI HIDEKAZU |
分类号 |
H01L21/203;G01K11/12;G01K15/00;H01L21/205 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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