| 摘要 |
PROBLEM TO BE SOLVED: To provide an identification mark, along with a semiconductor device bearing the same, which can be identified surely and easily through image identification. SOLUTION: There are provided a TEOS film 5 formed on the main surface of a silicon substrate 1, and a reflective pattern 21 consisting of an Al film 7 formed on the surface of the TEOS film 5. The identification mark comprises a polyimide film 2 formed on the layer upper than the reflective pattern 21, and is provided with a reflection suppressing pattern 22 which, in top view, covers the region adjoining the peripheral part of the reflective pattern 21. With this configuration, the contrast at the peripheral part of the identification mark is enhanced, preventing erroneous recognition when identifying an image. COPYRIGHT: (C)2008,JPO&INPIT
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