发明名称 CRITICAL DIMENSION UNIFORMITY OPTIMIZATION
摘要 Embodiments of an apparatus and methods for providing critical dimensions of a pattern. Pattern parameters and process history from a first substrate are used to create a thermal modes. The thermal mode is employed to established intelligent set points for zones of a substrate heater. A second substrate is position proximate the heater. The actual temperature of each zone is controlled using the corresponding intelligent setpoint.
申请公布号 US2008228308(A1) 申请公布日期 2008.09.18
申请号 US20070685570 申请日期 2007.03.13
申请人 TOKYO ELECTRON LIMITED 发明人 PHELPS HOWELL R.
分类号 G06F19/00 主分类号 G06F19/00
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