| 发明名称 |
ATOMIC LAYER DEPOSITION USING ALKALINE EARTH METAL BETA-DIKETIMINATE PRECURSORS |
| 摘要 |
The present invention provides atomic layer deposition systems and methods that include metal compounds with at least one ß-diketiminate ligand. Such systems and methods can be useful for depositing metal-containing layers on substrates.
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| 申请公布号 |
WO2007002672(A9) |
申请公布日期 |
2008.09.18 |
| 申请号 |
WO2006US24995 |
申请日期 |
2006.06.27 |
| 申请人 |
MICRON TECHNOLOGY, INC.;QUICK, TIMOTHY, A. |
发明人 |
QUICK, TIMOTHY, A. |
| 分类号 |
C23C16/40;H01L21/316 |
主分类号 |
C23C16/40 |
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