| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a check status monitoring system of a substrate treating equipment, capable of maintaining cleanness degree in a clean room and also capable of monitoring real time check status of a substrate treating equipment. <P>SOLUTION: A check status monitoring system 300 for a substrate treating equipment is provided on each of a plurality os substrate treating equipment 100 which process a wafer 200. It comprises an equipment controller 270 for controlling the substrate treating equipment 100, and a monitor server 280 connected to the equipment controllers 270 through an electric circuit 292. The equipment controller 270 comprises an input part 276 for inputting daily check status of the substrate treating equipment 100, a storage part 274 in which the input information is stored, and a display part 278 which displays the input information. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
