发明名称 MANUFACTURING METHOD OF LIQUID CRYSTAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a liquid crystal device by which the occurrence of an alignment defect of a liquid crystal caused by ruggedness of an inorganic alignment layer formed by being affected by a rugged shape of an electrode constituted of an ITO film and the occurrence of a display defect such as a display unevenness can be easily prevented while productivity and reliability of the liquid crystal device are enhanced. SOLUTION: The manufacturing method includes steps S1 and S3 for forming, at normal temperature, a pixel electrode and a counter electrode applying driving voltage to a liquid crystal and composed of an ITO on a TFT substrate and a counter substrate, respectively, by using a film-deposition apparatus and steps S2 and S4 for forming inorganic alignment layers on the pixel electrode and the counter electrode, respectively. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008216943(A) 申请公布日期 2008.09.18
申请号 JP20070058190 申请日期 2007.03.08
申请人 SEIKO EPSON CORP 发明人 SHIMIZU YUICHI
分类号 G02F1/1343;G02F1/1337 主分类号 G02F1/1343
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