发明名称 SUBSTRATE INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate inspection device high in detection capacity capable of placing a substrate by avoiding the contact of a substrate feed arm and an inspection stage. SOLUTION: The substrate inspection device is equipped with a transparent placing stand (inspection stage 20) on which the substrate to be inspected (wafer 10) is placed, a placing mechanism A for placing the substrate to be inspected on the placing stand at a predetermined position and an inspection part 40 (illumination light 41, an optical fiber 43 and an imaging element 44) for irradiating the back of the substrate to be inspected with light through the placing stand to inspect the substrate to be inspected. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008215976(A) 申请公布日期 2008.09.18
申请号 JP20070052360 申请日期 2007.03.02
申请人 NIKON CORP 发明人 INOUE TAKESHI
分类号 G01N21/956;G01N21/84 主分类号 G01N21/956
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