| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of at least reducing or suppressing an effect of un-uniform heat generation of an element of a projection system. <P>SOLUTION: In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus. <P>COPYRIGHT: (C)2008,JPO&INPIT |
