| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the exposure position accuracy of a mask pattern of a photomask. <P>SOLUTION: An exposure device is disclosed, which is equipped with: a conveying means 1 for conveying a color filter substrate 7 in one direction; a mask stage 2 for holding a photomask 9 close to and opposite to the color filter substrate 7, the photomask having a line of mask patterns 12 and three thin line patterns formed on an axis parallel to the center axis of the line of the mask patterns 12 and intersecting the axis at different angles from one another; a light source 3 emitting exposure light to irradiate the color filter substrate 7 through the photomask 9; an imaging means 4 having a plurality of light receiving elements 22 arranged along a straight line in a direction approximately orthogonal to the conveying direction of the color filter substrate 7 and photographing the three thin line patterns on the photomask 9; and a control means 6 processing the image photographed by the imaging means 4, measuring the intervals of the three thin line patterns to calculate a shift amount of the photomask 9 in the conveying direction, and correcting and controlling the irradiation timing of exposure light in accordance with the shift amount of the photomask 9. <P>COPYRIGHT: (C)2008,JPO&INPIT |
